Key Products: Magnetron Sputtering Cathodes; Plasma Vapor Deposition Materials; Sputtering Targets; Spectroscopic Plasma Monitor Systems
Angstrom Sciences designs, engineers and manufactures high-performance Magnetron Sputtering Cathodes and PVD materials for all thin film applications. The patented Angstrom Advantage™ design used in our Circular, Linear, and Cylindrical Magnetrons provides the unique combination of high target utilization, uniformity, and deposition rate. Angstrom Sciences also offers a comprehensive selection of High-Purity Vacuum Deposition Materials. Using a variety of specialized processes, we provide homogenous, fine-grained, high-density materials that conform to the strictest quality standards.
Angstrom Sciences also represents Plasus- EMICON Spectroscopic Plasma Monitor Systems. These process flow controllers are high-speed closed-loop process gas controllers, designed for real-time, in-situ precision control of reactive sputtering-based vacuum coating and plasma treatment processes. They are complete, compact, flexible, convenient to use, and economical solutions which can be readily integrated into new as well as existing systems. Equally at home in production or R&D tools, process flow controllers can bring about demonstrable improvements in process stability, repeatability, and yield. A wide range of accessories are available including sensors specifically designed for HIPMS Sputtering Applications.